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VFS4300L Laboratory Void Sensor

Supplier: Kenelec Scientific

The void sensor is an ideal instrument to monitor the amount of gas bubbles presented in a liquid. It is used to detect the volumetric fraction of gas phase, called gas void fraction, at a point in liquid flow.

Price Guide: POA

The void sensor instrument can be used for monitoring existence of gas bubbles, in a wide range of industries. It is capable of measuring in-situ gas void fraction in three-phase (gas-liquid-solids) flow reactors.

The instrument is designed for use across a broad range of industries including chemical, wastewater treatment, food, and mining and minerals processing.

The instrument will enable gas-sparged reactors and floatation cells to be monitored and controlled on-line making it possible for operators to control and improve reaction process efficiency during the mixing process. Current operations rely on historic mixing patterns (these may not be fully efficient or vary between batch mixes) and are only monitored or checked when the process has been completed.


• Monitor gas bubbles distribution in reactors in the mineral processing industries, e.g. oxygen bubbles in gold leaching, air bubbles in mineral sands processing and places where gas sparging are used;

• Monitor air entrainment into the pipelines, tanks process plants, to avoid equipment foaming problems, pipe vibration and pump failure problems;

• Measure quantity of air bubbles used in food processing, e.g. ice cream production and many aerated food products.

• Monitor air bubbles in wastewater ponds, and tanks to provide insight into the performance of aeration;

The dispersion of gas is of vital importance in industrial applications. The uniform dispersion of gas [Figure (a)] will maximise the contact between different phases and therefore achieve maximum gas-to-liquid mass transfer efficiency.

The void fraction probe can be used to determine the dispersion and mixing of gas bubbles in mineral processing reactors. Such as for monitoring oxygen injection in gold leaching tanks, air sparging in synthetic rutile processing of pigments and a wide range of other gas sparging applications.

Most industrial processors do not operate in the ideal situation of complete gas dispersion. The gas phase often is only dispersed to limited region in the reactors [Figure (b)] as found from various research activities. A non-uniform dispersion of the gas phase can lead to inferior product quality, lower throughput and inefficient usage of energy for some processes.

Gas monitoring is also important for inline process control. Change of input conditions such as flow rate and slurry property usually requires change of gassing rate and/or impeller speed. Such a change will affect the gas dispersion pattern. It is important to control the process condition so that the gas dispersion is optimised in order to achieve maximum efficiency.



  • Accuracy ±5% void fraction in gas/liquid mixtures
  • Repeatability 0.1%
  • Usable range 0 to 100% void fraction
  • Bubble size >1.0 mm diameter for detection


  • Tip size 1mm diameter x 1mm long
  • Maximum Pressure 200 kPa
  • Minimum liquid conductivity 2 µS/cm
  • Maximum liquid conductivity 2 mS/cm
  • pH 2-11
  • Operating temperature 5 to 80C
  • Connecting cable 4.0m
  • Dimensions 19mm diameter x 1.13m long
  • Weight 1.56 kg


  • Display Back-lit LCD, 2 x 16 lines
  • Operating temperature 0 to 50C
  • Dimensions 85 x 263 x 270mm (HWD)
  • Weight 1.36 kg
  • Power AC adaptor, 5 VDC ±5% 1 Amp

Specifications subject to change without notice